Used KLA / TENCOR 2135 #192496 for sale
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ID: 192496
Wafer Size: 6"
Vintage: 2000
Patterned wafer defect inspection system, 6"
Handler: 6" open cassette (x2)
Cassette handling: vacuum handling open handler
Robot: KLA robot, single end-effector
Inspection station module: KLA2135-IS
User interface module: KLA2135-UI
Chuck type: low contact (dimpled)
Light spectrum: visible 2.9
Pixel size in um: 0.62, 0.39, 0.25
CE Marked
PC configurations:
CPU: PII 300 MHz
Memory: 512M
OS: Windows NT
3.5” floppy drive
Application software: version 5.3.084
GEM/SESC (HSMS)
Network comm.: BNC, Ethernet (Cat 5)
Fan (blower) Unit
Remote power disconnect panel
Facilities:
Line conditioner: 208 V, 50 A, 3 phase, 50/60 Hz
Inspection station: CDA 80 PSI measured at the main system regulator
Performance requirement:
DSW75 capture rate > 90%.
DSW75 repeatability > 95%
User Manual
2000 vintage.
KLA / TENCOR 2135 is a mask and wafer inspection equipment which provides high-precision defect detection, utilizing advanced algorithmic techniques to detect and measure particle-level contamination on any substrate. This system delivers excellent image quality, fast throughput, and improved process optimization. KLA 2135 delivers excellent dynamic range images and uses a variety of high resolution scanning techniques, such as laser scanning, electron beam scanning, and parametrics analysis. TENCOR 2135 unit provides a large variety of high-performance features that enable accurate, reliable inspection of electronic components. The machine is capable of detecting sub-nanometer defects with high-quality images. This makes it ideal for detecting and measuring a wide range of process-related defects such as particle contamination, voids, scratches, and other optical contaminants. The tool also offers industry-leading scanner technologies and advanced image analysis algorithms that enable high yield, accurate review and phase shift analysis. The asset's advanced defect classification capabilities allow the user to identify and classify surface-level defects while its multi-spectral imaging technique ensures that a wide variety of mask types can be inspected with accurate results. The model also offers an automated process optimization feature that allows users to quickly analyze and optimize a process based on the results obtained from any imaging process. 2135 equipment also features a high throughput inspection capability, enabling fast and efficient scanning with no need for manual intervention. It also has a built-in defect tracking and documentation system which allows users to track and review defects from multiple images. To ensure accurate and reliable detection and comparison of defects, KLA / TENCOR 2135 unit utilizes advanced algorithmic techniques for defect detection and characterization. These algorithms are designed to maximize efficiency and accuracy in the process of defect identification and qualification, ensuring excellent image quality and improved process optimization. Overall, KLA 2135 machine is an advanced and cost-effective solution for defect detection and characterization in the manufacturing environment. It provides high-precision defect detection with excellent image quality and fast throughput, as well as automated process optimization and efficient defect tracking. By combining quality and performance, TENCOR 2135 tool is an ideal choice for any manufacturer looking for an advanced, efficient, and reliable mask and wafer inspection asset.
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