Used KLA / TENCOR 2135 #9139553 for sale

KLA / TENCOR 2135 is an automated optical inspection equipment used for the mask and wafer inspection of semiconductor devices. It is designed for inspecting a variety of types of masks and wafers, ranging from micro-processors to system on chips. Its design combines the use of advanced optics, software algorithms, and material physics to yield increased accuracy, speed, and repeatability. At the heart of the unit is a high-resolution camera, which is used to capture images of the wafer or mask. These images are then processed and analysed to identify structural defects, such as cracks and voids, in the surface of the device. The camera is mounted on a moveable platform, capable of accurately positioning the camera head over a particular region on the device. This allows for multiple images to be taken around, and across, an entire device. The software algorithms employed by the machine are able to take the images captured by the camera and analyse them to identify specific defects in the surface of the wafer or mask. This process of analysis allows for a high level of accuracy in defect detection. The tool is further able to identify the precise location of any identified defects, and to provide a detailed analysis of the defects. In addition to its defect detection capabilities, KLA 2135 also offers a range of other features. It is capable of providing detailed measurements of features within the device, such as line widths and thicknesses. These measurements can be used to determine the accuracy and precision of the mask or wafer being inspected. The asset is also able to provide detailed analysis of the material properties of the device, including its optical properties and electrical characteristics. This information can be used to further ensure that the device is manufactured to the required specifications. TENCOR 2135 is a highly accurate and versatile model, capable of carrying out precise inspections on a variety of semiconductor devices. Its combination of advanced optics and sophisticated software algorithms provides for a high level of accuracy and repeatability in defect detection and material analysis.