Used KLA / TENCOR 2135 #9254151 for sale

KLA / TENCOR 2135 is a versatile, advanced automated mask & wafer inspection equipment able to inspect wafers of up to 8 inch in diameter from bumper to bumper, with a remarkable resolution of 0.5 microns (500 nm). This is made possible by its Advanced Beam Profiler and Φ5 mm outer field of view which capture the most accurate and comprehensive topological imaging process of critical structures on a die face. The system is equipped with Image Coding to improve metrology and workflow accuracy. In addition to stereo-imaging, KLA 2135 utilizes aerosol layer imaging (ALI) technology, a groundbreaking approach that activates more high-resolution distinct detections of small particles and defects, like dust and contamination. It also offers a built-in wide range Illumination Uniformity Class Illumination Unit with up to 6 different characteristics-from low-light to high-light-achieving the best image quality free from any shadow or flare effects. TENCOR 2135 also reduces multiple types of systematic errors with its innovative Total Feature Image Analysis (TFIA) technology, which allows for a multi-point feature characterization process in order to identify varied pattern sizes and shapes. Moreover, the machine is provided with a Color Material Map for enhanced visual monitoring as well as Input/Output facilities for data transfer. It comes with a proprietary software package, 7PiiQ, that contains a full suite of features from inspection to optimization. Visualize-it provides a unique set of advanced analytics for operators to identify and troubleshoot any issues. Predict-it functions as an automated electrical, stress and optical design rule checker (DRC) linked with the die's vision characteristics to immediately detect errors at the leading edges. The software also enables users to track and analyze design rule violations and define customizable accept/reject settings. 2135 mask and wafer inspection tool is an innovative advanced solution, that is unrivaled in its speed and throughput as well as accuracy and resolution, making it ideal for mid- to high-volume production in the semiconductor industry.