Used KLA / TENCOR 2135 #9383823 for sale

KLA / TENCOR 2135 mask and wafer inspection equipment is a versatile, automated system designed to inspect patterned masks and semiconductor wafers. The unit contains both a brightfield and darkfield oblique light inspection methods including brightfield bright-dark differential inspection, darkfield bright-dark differential, and darkfield critical dimension. The machine is built with two interdependent components: the Differential Mode Observatory and the Wafer/Mask Defect Review Station. The Differential Mode Observatory (DMO) combines a brightfield/darkfield imaging tool and a wafer/mask stage to support multiple linear and oblique laser illumination angles. It is equipped with a high-resolution camera and imaging asset that can detect and quantify finite defects. The Wafer/Mask Defect Review Station has a motorized xy-stage, capable of scanning both the wafer and mask for defects. The station contains multiple light sources that illuminate the wafer/mask in various angles of incidence, including brightfield and darkfield illumination. This allows for high resolution, large field-of-view defect inspection to be done on small and large devices, with the smallest feature sizes detectible being as small as 5nm. KLA 2135 is designed to investigate various types of wafer/mask defects and faults, including electrical short circuits, lithography opens, photoresist defects, film cracking, and pattern misalignments. It is also capable of inspecting 248mm to 500mm wafers and 4-inch to 8-inch masks. TENCOR 2135 comes with web-based analytics and reporting tools that allow operators to gain real-time views into the model's inspection processes. This eliminates the need for manual logging and allows for a quick and easy analysis of data generated. Overall, 2135 mask and wafer inspection equipment is an invaluable and versatile system for automated defect detection and fault analysis. It is an essential tool for modern production and can help to improve yield and product quality.