Used KLA / TENCOR 2138 #192497 for sale

KLA / TENCOR 2138
ID: 192497
Brightfield defect wafer inspection system.
KLA / TENCOR 2138 is a high-performance automatic mask and wafer inspection equipment designed to detect a variety of defects and foreign particles on wafers and masks. The system utilizes a combination of advanced metrology and non-destructive test techniques for effective inspection. The unit utilizes an advanced dual-sensor architecture which combines high-resolution microscope imaging and scanned laser technology. The optical microscope provides a greater resolution and contrast than traditional digital imaging technology, while the laser scanning machine provides a more accurate way to detect defects. The two sensors work together to provide reliable and accurate inspection capabilities. KLA 2138 is equipped with a powerful image acquisition and processing software which is designed to optimize defect recognition and characterization. The software uses a variety of algorithms such as edge detection, defect recognition, auto focus, and image enhancement techniques to quickly and accurately identify defects and foreign particles, even in the most difficult patterns. The tool offers a variety of measurement parameters including size, shape, and position. The sensitive asset is able to detect any defect as large as 12 nanometers and smaller without affecting the underlying device structures. It can also detect signals of 235 nanometers and smaller, while measuring in three dimensions. TENCOR 2138 is designed to be a reliable and efficient instrument for inspecting masks and wafers. It provides unparalleled accuracy and reliability in detecting defects and foreign particles. The model is capable of inspecting a variety of materials on various wafer sizes and surface finish types. It is also capable of performing a variety of inspection tasks, including failure analysis, life test, and damage inspection. It is designed to reduce the need for multiple inspections, thus reducing the cost of inspections and increasing yield and throughput.
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