Used KLA / TENCOR 2138 #9115814 for sale

KLA / TENCOR 2138 Mask & Wafer Inspection Equipment is a comprehensive, fully automated solution that provides high-speed inspection of process patterns on wafers and other semiconductor devices during production. This system is specifically designed to help semiconductor manufacturers reduce defects and improve productivity by optimizing their overall process control. This unit can help detect defects on mask and wafer surfaces with unparalleled detection accuracy. It uses advanced image processing to identify fine features with minimal influence from noise and non-uniform illumination. Additionally, it can detect edge lithography errors such as missing contact holes, boosting the yield of the process. With a fast acquisition speed, it captures images of several specimens at once using high throughput cameras, enabling faster wafer handling. This machine also includes an ergonomic and efficient operator interface that simplifies workflow management. KLA 2138 tool offers a variety of features for improved wafer and mask management. It serves as a multi-site work station where users can log into remote locations, select parts, and analyze images. It includes an industry-standard transistor-level metrology feature for measuring wafer dimensions, distance between critical features of the process, and other relevant parameters. It can also measure the unpatterned surface roughness. The asset's automated defect inspection mode is designed for examining wafers in real time with up to 3 magnification levels. It can identify chips and defects on the edge of wafers using advanced algorithms. To help ensure high accuracy, the model offers different vision systems that provide optimized pattern inspections and simultaneous defect location measurements. TENCOR 2138 Mask & Wafer Inspection Equipment also provides documentation and recording features. Each measurement session is stored in its database and each step is logged along with all parameters. The generated reports contain detailed information for each wafer or mask inspected. This helps provide reliable statistics of defect distributions at different pattern levels. All in all, with its automated defect recognition and reporting capabilities, 2138 Mask & Wafer Inspection System is the perfect solution for helping semiconductor manufacturers reduce process time and improve defect yields. With its multiple features and capabilities, it can effectively and efficiently ensure the highest quality for a variety of production and process requirements.