Used KLA / TENCOR 2139 #135494 for sale

KLA / TENCOR 2139 is a high precision, automated mask and wafer inspection equipment. It electronically detects and measures defects that may be present on the surfaces of metal masks and semiconductor wafers during the production process of integrated circuits and photomasks. With its advanced optical and laser scanning technology, KLA 2139 system can analyze the optical characteristics of chips, transistors, and other circuit components at microscopic levels. TENCOR 2139 unit has a sophisticated imaging and analysis capability, allowing it to quickly scan and evaluate masks and wafers. The machine can detect even the minutest defects that may not be visible to the naked eye and ensure excellent defect-free yields. It features special software on its PC-based user interface that can be customized to meet the specific need of any application. Utilizing non-contact, non-destructive laser and optical measurement technologies, 2139 tool can identify unwanted particles and defects, such as pattern defects and pits. The asset can also measure the stress on masks and wafers, enabling tight control of key process parameters. KLA / TENCOR 2139 model also features a closed-loop defect-classification equipment that provides defect-by-defect accuracy, enabling higher yields and improved device manufacturing. This system increases throughput and accelerates processtime, reducing turnaround-time and product cost. High-speed data acquisition and fully automated defectclassification, along with vector and pattern recognition makes the unit ideal for on-line, real-time defect inspection. With the ability to quickly measure wafer and mask sizes, KLA 2139 machine can efficiently inspect images up to 2560 x 2560 pixels in resolution, with pixel-level accuracy. TENCOR 2139 tool offers multiple sampling, testing and evaluation capabilities over different areas for improved accuracy and to detect otherwise imperceptible defects, providing an accurate and repeatable measuremeng. It has full-color map and review-display mode, allowing users to visualize the exact position and severity of each defect. 2139 asset is an ideal solution for defect detection, characterization of wafer and mask fabrication processes and design changing, providing highspeed and high-resolution imaging to ensure best defect inspection results.