Used KLA / TENCOR 2139 #293606933 for sale

KLA / TENCOR 2139 is a mask and wafer inspection equipment developed by KLA for semiconductor fabrication. The system is based on laser technology for automated inspection of a range of defects on wafers, masks, and LCDs. It provides high-precision alignment of samples with its dual automated wafer stage and a wide area measurement with the high-resolution laser line. KLA 2139 unit is designed to maximize the productivity of the inspection process, with accurate measurement of defects in real time. It can quickly detect pattern displacement between mask and wafer, as well as subtle color differences in LCDs. The machine also offers a powerful post-inspection analysis capability, with powerful software to provide robust analysis and statistical assessment, to ensure trustworthy and repeatable results. The main components of the tool include the High Resolution Laser Line and the Dual Automated Wafer Stage. The High Resolution Laser Line provides long scanning length up to 150mm and high dynamic focuses, with a large depth of field, for comprehensive defect detection. The Dual Automated Wafer Stage ensures accurate alignment for the sample and provides consistently repeatable results across the wafer. TENCOR 2139 asset also features a wide range of advanced technologies, such as laser focus optimization, edge inspection, defect classification, particle analysis, and defect size metrology. The model also offers sophisticated light-emitting diode technology for detecting defect locations and providing greater data accuracy. The equipment can be used for a wide range of applications and inspections, including LCDs, e-sensors, HDI, posterization and film stress, circuit pattern analysis and layer counting, and process monitoring. The system is also configured and calibrated with transparent samples, in order to facilitate efficient defect measurement and traceability. 2139 unit is highly reliable and offers a wide range of benefits, including optimized inspection process, improved accuracy of measurements, and reduced cost per wafer. With its robust and reliable performance, the machine is suitable for any application requiring rapid and reliable mask & wafer inspection.