Used KLA / TENCOR 2139 #9190703 for sale
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ID: 9190703
Brightfield inspection system
Loading configuration: Integrated SMIF
Operating system: Windows NT
Chuck
Cables
Fan modules
GEM/ SECS Interface
3.5" Floppy drive
10Base-T and BNC (10Base-2)
Pixel sizes (Random / Array): 0.160, 0.250, 0.391, 0.625, and 1.250
Power: 208-480V
2001 vintage.
KLA / TENCOR 2139 is a sophisticated automated mask and wafer inspection equipment designed for advanced semiconductor production lines. It is equipped with a brightfield imaging system, motorized XYZ stages, and a vision unit with ultra-high optical resolution for fast inspection at a fraction of the cost compared to traditional methods. KLA 2139 utilizes brightfield illumination and motorized XYZ stages to achieve high-resolution imaging of masks and wafers. By using multiple optical imaging views, the machine is able to provide flexibility when inspecting the surface features of the wafer or mask, such as stitching, contact lines, and other micro features. The vision tool of TENCOR 2139 includes a high-performance processor with an improved resolution up to 200 nm, allowing operators to detect even the smallest defects in the masks and wafers with ease. The CCD cameras and microscopic lasers can vary in both intensity and resolution to ensure accurate analysis, while the motorized XYZ stages allow for quick re-positioning and inspection of different areas. In addition, 2139 is equipped with advanced defect detection and classification software, which can accurately recognize various defects, including pits, beads, and black spots. These features enable the asset to identify and classify contaminate wafers quickly and efficiently. Furthermore, KLA / TENCOR 2139 provides advanced wafer-level defect review and editing tools for quick and easy handling of errors and defects. The results of the inspection can be organized and filtered for further analysis. This model also includes a library of commonly used image-processing algorithms, including automatic stitching, contrast enhancement, and pattern recognition to further improve its accuracy. KLA 2139 is an ideal equipment for wafer showings and yield optimization, enabling fast and accurate inspection. With its extended functionality, the system is the ideal solution for precise and reliable inspection of various types of mask and wafer designs.
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