Used KLA / TENCOR 2139 #9227709 for sale

KLA / TENCOR 2139 is a next-generation mask & wafer inspection equipment, designed to meet the high-speed, high-accuracy, and high-capacity requirements of today's most advanced semiconductor process geometries. KLA 2139 features four-dimensional imaging stations to produce sharp 3D images with extreme accuracy and resolution, along with advanced pattern recognition software for pinpoint detection of potential defects. It is capable of performing simultaneous inspections of up to four separate inspection areas in a single image, and is equipped with an enhanced user-interface designed to make data analysis and interpretation efficient and accurate. The system employs pinpoint sub-pixel data capture to capture microscopic details of individual defects and debris, using an optimized Python-based image processing pipeline. The imaging components of TENCOR 2139 include both a bright-field and dark-field detector array, along with an optimized optical unit designed for fast data acquisition and imaging. It also includes a thermo-electric cooled EMCCD to ensure the thermal noise is minimized and the brightness is maximized for high quality imaging. In addition to providing high-quality 3D imaging, the machine is also designed to be fast, reliable, and easy to use. It has a high-precision stage, which enables the tool to perform multiple inspections quickly and accurately. It is also equipped with a multi-directional aperture to enable the inspection of ultra-small particles, and can be integrated with an automated defect review station to further enhance its processing capabilities. In addition to its imaging capabilities, 2139 is also designed to handle a wide range of inspection tasks. Its proprietary omni-directional matching algorithm allows it to compare patterns of features and center them within the inspection mask quickly and accurately. The asset also supports defect classification through intelligent algorithms, and is able to detect defects in real-time with different levels of confidence. Finally, it is capable of performing layer-thickness measurements and parsing feature and defect information to generate a versatile set of reports and analysis. Through its combination of high-resolution imaging, advanced pattern recognition algorithms, and fast processing speeds, KLA / TENCOR 2139 has become the standard for mask & wafer inspection in the semiconductor industry. With its industry-leading performance and ease-of-use, it is an ideal choice for up-scale, cost-effective semiconductor production.