Used KLA / TENCOR 2139 #9244609 for sale

KLA / TENCOR 2139 is a high-end Mask & Wafer Inspection Equipment. It is designed for the inspection, analysis, and measurement of integrated circuit wafers, allowing manufacturers to quickly identify anomalies. The system is suitable for use in advanced lithography processes, such as immersion lithography or double patterning. KLA 2139 uses a unique 5x optical beam path to quickly and accurately inspect wafers for defects and critical parameters. Its extremely accurate pattern recognition, anomaly detection, and lithography masking algorithms enable close scrutiny of sensitive devices throughout the inspection process. The unit also offers a range of features such as automatic defect categorization, real-time defect review, and process edge mapping. The machine includes advanced illumination techniques such as brightfield and darkfield, as well as various imaging modes such as backscatter imaging and near ultraviolet imaging. These techniques help reveal features and details that are often not visible to traditional inspections. The combination of advanced illumination, imaging modes, and pattern recognition capabilities yields fast, easy-to-interpret results and better-informed decisions. TENCOR 2139 can also perform alignment, overlay, and overlay deviation measurements—essential for precise positioning during lithography processes. This ensures consistent thickness of the applied resist and resolution across the wafer. It also helps reduce costly mask modifications and rework. The tool is equipped with proprietary auto-focusing technology that reduces imaging time by automatically focusing on the wafer before each shot. Its rigid granite-based construction and vibration isolation asset keep dimensional tolerances in check, even in high-density production environments. With its ease of use, advanced capabilities, and flexibility, 2139 is an ideal tool for advanced lithography and microelectronics production.