Used KLA / TENCOR 2139 #9351630 for sale

KLA / TENCOR 2139 mask and wafer inspection equipment is a unique solution for mask and wafer yield and process control. KLA 2139 system provides automated pattern recognition with a high degree of accuracy, enabling fast and repeatable analysis. The unit consists of a lithographic imaging and analysis machine, a mask aligner wafer scanner beam and an integrated inspection tool. The lithographic imaging asset has several sophisticated optics and illumination systems, capable of detecting small defects even at extremely small areas. The mask aligner is capable of detecting fine-scale structure and sub-micron pattern variations such as line edge roughness (LER). The wafer scanner beam creates a high-resolution image of the mask or wafer structure which is then analyzed to detect defects. The model's algorithms can detect defects ranging from 0.2 microns to 10 microns and offers unparalleled detection precision and repeatability. The equipment's image processing technologies enable precise defect detection, allowing for exact mask and wafer inspection. The system also offers versatility in detecting a wide range of variations from single and multiple pattern to geometric patterns as well as process generated defects. In addition, the unit is capable of characterizing and analyzing defects in a number of ways, including inspecting blanks in both pre-exposed and post-exposed conditions. It further permits image analysis with programming flexibility and includes an analysis suite of tools designed to accommodate unique user requirements. Finally, the machine's easy-to-use GUI allows for easy configuration, data manipulation, and advanced analytics. As part of its comprehensive reporting and logging capabilities, it offers numerous metrics including defect size, location, type, amount, and cause. In addition, it can also provide 3D-surface display of the inspected mask or wafer and generate sector-based reports. Overall, TENCOR 2139 offers an unparalleled mask and wafer inspection tool with efficient and repeatable defect inspection capabilities. It also offers integrated defect analysis and reporting solutions to meet any user's needs. It is a unique solution for ensuring yield and process control, allowing users to guarantee performance across a wide range of devices.