Used KLA / TENCOR 2351 #9136720 for sale

KLA / TENCOR 2350 is a mask and wafer inspection equipment designed for use in the semiconductor industry. It is a high-performance, cost-effective tool for collecting detailed images and measurements of semiconductor wafers and masks. KLA 2350 has the ability to quickly acquire and analyze data at the submicron resolution, allowing for quick and accurate wafer inspection, defect detection, and quality control. TENCOR 2350 features an advanced optics design which allows for higher resolution imaging and superior signal to noise ratio compared to similar blazed-grating masks. It also utilizes high-accuracy, plasma-based MOEMS (Microelectro-mechanical) scanning stages for fast and repeatable scanning of wafers and masks. 2350 has a large field of view (12" x 12") with no distortion, permitting a wide range of inspection tasks for both planar and circular structures. KLA / TENCOR 2350 is equipped with a high-performance, 1.3 megapixel sensor which allows for fast and accurate data acquisition. The sensor can be configured with a range of different modes, including brightfield, darkfield, and stitched images. It is also equipped with a full suite of defect review, classification, and comparison tools, as well as a variety of other image processing functions. For advanced mask inspection applications, KLA 2350 has a built-in high-resolution demodulation system, which can provide greater accuracy than conventional systems. The demodulation unit can perform edge detection, defect isolation, and defect recognition tasks in real-time. In addition, TENCOR 2350 also includes an integrated host software architecture which allows for easy integration with other instruments for enhanced performance. 2350 is ideal for challenging applications requiring repeatable, and reliable inspection, measurement and analysis. It is designed to be highly configurable to match the specific needs of a wide range of customers, from research scientists to high-volume production lines. The machine can be used both in the lab and in production environments, providing an effective solution for improving quality control and reducing process defects.