Used KLA / TENCOR 2350 #9136721 for sale

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KLA / TENCOR 2350
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ID: 9136721
High resolution imaging inspection system, 8"-12" Dual FIMS EFEM, 8" GEM SECS and HSMS Signal light tower XENON Lamp: 150 W Wave length illumination: 370 ~ 720 nm Wave length band: Visible, UV, i-line Pixel size: 160 ~ 250 nm MM2S Board User Interface (Ul): Computer monitor Wafer display Industrial PC (IPC) Image computer (IMCs) Inspection Station (IS): Granite suspension Optics plate Air filter Stage cooling Wafer handler (EFEM) Dual open, 8"-12" Dual SMIF, 8" Dual FIMS, 8"-12" Missing parts: Hard Disk Drive (HDD) Keyboard, mouse and joystick Solenoid board with valve and AF LED board Y1 Flex board (2) FVPA Boards Robot controller Fan Filter Unit (FFU) Ul and IS Cable RGB Cable RS232 Cable Joystick cable EMO Cable (4) IMACS TO UI Cables (2) AZP FFA Cables MIB Cable Digital camera cable 2001 vintage.
KLA / TENCOR 2350 mask and wafer inspection equipment is a high-performance inspection platform, providing accurate, repeatable, and automated multi-layer dielectric and metrology measurements. The system utilizes specialized optics developed for the specific needs of the lithography market, including diode, OCT, and linear-variable diffraction gratings (LVDP). KLA 2350 is capable of measuring both the reflexivity and scattering of dielectrics on the reticles and wafers. It has a tunable wavelength range from 355 nanometers to 730 nanometers, making it suitable for inspection across a broad variety of materials and applications. It has high dynamic range and excellent sensitivity, capable of providing images with resolutions down to 0.4µm. The inspection unit also includes several specialized programming algorithms such as wafer partial defect analysis, reticle pull-through analysis, and dielectric profile measurement. It is integrated with powerful image-processing and data-analysis functions, including Mura detection, auto-alignment, and image-stitching. This machine includes an intuitive graphical user interface, allowing the user to easily access, configure, and control the instrument. It also provides connectivity to external databases, allowing users to easily link the process data to quality control programs. TENCOR 2350 is designed to deliver consistent results, reduce variability, and decrease the time to detect defects in advanced photomask and wafer processes. With its advanced image-processing capabilities, the tool can quickly detect and analyze defects in real-time. Additionally, its integrated metrology and automated analysis software enable precise, repeatable dielectric characterization in a single step. Overall, 2350 inspection asset is an efficient, cost-effective solution for reliability and performance control in the semiconductor industry. Its advanced technologies, such as laser diffraction, OCT, and diode, provide unparalleled accuracy and repeatability. With its integrated software and intuitive user interface, it is one of the most efficient and reliable systems in the market.
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