Used KLA / TENCOR 2350 #9296887 for sale

KLA / TENCOR 2350 Mask and Wafer Inspection equipment is a state-of-the-art imaging and inspection system designed to maximize the throughput and accuracy of high-volume semiconductor production. This unit utilizes advanced optical and imaging technologies to efficiently inspect the masks and wafers during the manufacturing process. First, KLA 2350 acquires high-resolution images of both the masks and wafers. The machine uses diffraction-based imaging to ensure accurate acquisition of features and defects. This imaging tool also includes an integrated vision asset that uses image segmentation to improve inspection accuracy. This integrated vision model is then used to rapidly detect fine and submicron-grade features and defects and to accurately classify them. TENCOR 2350 also uses advanced pattern recognition algorithms to analyze both the masks and wafers in order to identify any defects or anomalies that may exist. This pattern recognition equipment is able to rapidly detect various types of defects, such as scratches, voids, pinholes, and dislocations. Once the system has identified these defects, it can either report them or can provide advice for process improvements. Finally, 2350 features a high-performance spectral imaging unit. This machine provides high-precision spectral imaging that can detect subtle defects in the masks and wafers. The spectral imaging is combined with high powered filters to precisely identify the location and size of any defects. All of these features make KLA / TENCOR 2350 an attractive inspection tool for high-volume semiconductor production. The combination of high-resolution imaging, integrated vision, advanced pattern recognition algorithms, and high-precision spectral imaging enables KLA 2350 to accurately and quickly inspect masks and wafers while minimizing the possibility of false detections and false alarms. This ensures that each production run is more efficient and accurate than ever before.