Used KLA / TENCOR 2351 #293606934 for sale

KLA / TENCOR 2351 is a leading wafer and mask inspection equipment designed to provide high resolution measurements of the surface and profile of die structure, layers, and information regarding any manufacturing defects. This highly advanced system is equipped with a range of digital imaging, automated analysis, and advanced wafer surface and mask inspection technologies. KLA 2351 unit is capable of rapidly and accurately inspecting feature dimensions and materials, aiding in defect assurance and continuous process improvement. TENCOR 2351 is equipped with a Macro Die Inspection machine, which enables the inspection of up to 2000 die on a 3" wafer at full-field resolution. With 2351's advanced imaging technology, images having up to 8MP can be acquired. KLA / TENCOR 2351 is also capable of searching for defects such as sidewall roughness, defects due to previous process activity, dicing damage or undesired patterning. The advanced Mask Inspection tool of KLA 2351 allows for the inspection of masks with high performance imaging and scanning. The optics for the mask inspection have been designed for high resolution imaging, such as with backside images and CD measurements. The 2351mask asset is capable of reading mask images of up to 2µm features with extreme accuracy and precision. In addition, substrate defects such as CD mismatch and CD uniformity can be monitored with sub-µm accuracy using their CD-SEM imaging model. TENCOR 2351 is also equipped with a sophisticated Automated Defect Analysis equipment, which can identify micro-scopic defects automatically and report on the nature of any defects detected. Today's advanced semiconductor devices require ever higher resolution semiconductor fabrication processes, and 2351 is equipped with state-of-the-art software which can monitor, measure and classify particles, pits, pits and other critical surface defects. Furthermore, KLA / TENCOR 2351 offers a full suite of data analysis and reporting capabilities, allowing process engineers the ability to easily move between automated defect analysis, equipment management and process control. In summary, KLA 2351 is a truly advanced, feature-rich system for inspecting wafers and masks. TENCOR 2351 provides high resolution imaging, automated defect analysis, and advanced wafer surface and mask inspection capabilities, aiding in process control and defect assurance. Furthermore, with its automated analysis unit, 2351 can detect microscopic defects with ease and accuracy, providing the process engineer with the best possible assurance and control.