Used KLA / TENCOR 2365 #293606937 for sale

KLA / TENCOR 2365 Mask and Wafer Inspection Equipment is a leading-edge imaging network that focuses on semiconductor wafer, mask and device inspection. Uniquely engineered, the system excels in defect inspection, 3D topography inspection, critical dimension measurement and other challenging OEM applications. KLA 2365 delivers high quality imaging up to a large active surface size of 8" x 10" (20 cm x 25 cm) at nanometer resolutions. It also features wafer and flat panel defect analysis, including image etching and real-time review inspection. The unit utilizes large field of view, dynamic range and advanced software to effectively localize and identify defects. The patented automated defect analysis technology makes it easy to identify both random and structured elements on the wafer. With an easy-to-use graphical user interface, operators can quickly navigate the machine and manage workflow efficiently. The revolutionary Real-Time Review (RTR) mode presents all defect images during inline operation at a rate of up to 1280 wafers per hour. With powerful image compression, the tool reduces data storage needs while simultaneously providing efficient environment control. TENCOR 2365 leverages the latest in scatterometry and bright-field imaging technologies. A 200 watt ORION (Modular Scatterometry) light source provides the highest resolution imaging and characterization capability. The illumination asset can also be customized to meet specific applications with UV, IR, and pulsed laser light sources. The advanced 2365 wafer inspection network provides fast and accurate detection of surface defects, ensuring that wafers are defect-free and of the highest quality. The intelligent model optimizes Resolution, Contrast and Focus for each sample, making sure that each defect is properly detected. Using KLA / TENCOR 2365, operators can easily troubleshoot problems and quickly make modifications. The equipment proves to be an ideal choice for demanding applications, as it quickly and accurately detects macro defects, chip edges, particles, scratches, and other differential types of defects. This is why semiconductor chipmakers all around the world rely on KLA 2365 Mask and Wafer Inspection System.