Used KLA / TENCOR 2367 #293794239 for sale

KLA / TENCOR 2367 is a high-level, high-precision mask and wafer inspection equipment. It is designed to provide fast, reliable, and comprehensive defect inspection and analysis for environments that require a very high degree of control and accuracy. The system uses a combination of 3D imaging, scanning, and image analysis algorithms to detect and classify defects in the structures of semiconductor masks and wafers. KLA 2367 is based on a powerful multi-axis unit that utilizes a proprietary high-definition imaging technology. It allows for full-field 3D imaging and scan area coverage based on up to four axes of movement. The mechanical machine is driven by a high resolution encoder responsible for controlling the motion of the four axes of movement. This enables the acquisition of large number of images at high speeds with very high accuracy. The advanced 3D imaging technology employed in TENCOR 2367 is responsible for the high resolution imaging and defect protocol identification. The imaging tool, along with sophisticated image analysis algorithms, is used to detect and analyze defects in the structures of the mask and wafer. The asset performs automated defect identification for all types of dimensional, film, and surface defects, including pits, chips, fractures, scratches, and surface roughness, and generates detailed reports on the defect analysis. Additionally, 2367 is an integrated metrology model which is capable of measuring objects in 3D. The equipment's precision probe is responsible for the measurement, and is connected to the controller to ensure accurate positional accuracy and repeatability. The measurements are then analyzed and reported by the system's integrated software. In addition, KLA / TENCOR 2367 has additional features that provide users with greater flexibility and control. For instance, it features an automated autofocus unit which ensures accurate focusing over the entire scan field, thus eliminating manual adjustment. Additionally, the machine features a 'fast-mode' scanning option for high-speed scans, as well as the ability to configure individual regions of interest which allow for quick, targetted defect characterization. Overall, KLA 2367 is an advanced tool designed for mask and wafer inspection and analysis. It utilizes sophisticated imaging and image analysis technologies, combined with precise motion control and metrology, to provide fast, reliable, and accurate defect identification and characterization.