Used KLA / TENCOR 2367 #293815941 for sale

KLA / TENCOR 2367 is a mask and wafer inspection equipment equipped with advanced process control and yield management capabilities. This system is purpose-built to make sure that mask and wafer integrity is achieved with rigorous process control and repeatability. The unit integrates high speed scanning, image processing, and inspection analysis in order to detect defects at the mask and wafer level. KLA 2367 has the capability to detect particle-level defects and variability, which allow users to accurately monitor process control parameters and ensure proper yields. It can also detect subtle defects and variability in a single scan that may otherwise remain undetected in traditional inspection platforms. The machine features automatic alignment and wafer mapping capabilities, as well as a highly sensitive metrology tool that helps ensure that mask and wafer repeatability are achieved with highest accuracy. TENCOR 2367 provides two modes of inspection: brightfield and darkfield. Brightfield inspection is designed to detect contrast variations, particle-level defects, and translucent film defects. It can also detect particles or contaminants that may affect the yield of a wafer and mask. Darkfield inspection, on the other hand, is designed to detect particle-level defects, as well as dark spots and other non-uniformities in a substrate. 2367 is a powerful asset that provides a host of advanced capabilities for inspecting masks and wafers. It features efficient automated image processing and easy-to-use intuitive tools that make it simple to use and maintain. Its high resolution capabilities, combined with real-time process control and yield management, make it an ideal solution for critical mask and wafer inspection requirements. The fast scan rates ensure that a comprehensive monitoring of defects and variability can be performed in a single scan. This results in accurate and reliable yields for critical wafers and masks.