Used KLA / TENCOR 2367 #293819065 for sale

KLA / TENCOR 2367 is an efficient and high quality mask and wafer inspection equipment developed by KLA Corporation. KLA 2367 uses advanced technology to provide rapid detection of defects at the wafer level and mask level, as well as providing an informative analysis of results. This system includes a dual-beam laser projection unit that independently detects specifications on both sides of the mask, on which it produces a fast and accurate analysis of the mask patterns. Furthermore, TENCOR 2367 integrates a number of advanced optical methods, such as scatterometry, and has several automatic processes to ensure the accuracy and optimization of the inspection. 2367 provides high-resolution imaging of the wafer and reduces the time and cost associated with defect detection. Through varying the intensity levels on each pixel, it easily detects subtle defects- even tiny particles or thin lines in the mask image. It is also capable of detecting protruded or hidden patterns on the mask, sub-pixel defects, electrical and optical defects, overlay and overlay misalignments. Additionally, KLA / TENCOR 2367 machine can generate defect maps that identify mask patterns and areas of potential improvement. KLA 2367 tool also offers several features and options that enhance its functionality and effectiveness. For instance, it includes a powerful image processing software that can generate 3D volume data from SEM (scanning electron microscope) images. It also offers customizable measurement temperature settings to ensure accuracy with different wafers, as well as the ability to control dust detection area, UV laser intensity, exposure time, and more. Furthermore, it is compatible with various types of samples, such as wafers and masks, to ensure accurate, high-speed processing. In sum, TENCOR 2367 is an advanced mask and wafer inspection asset that uses state-of-the-art technology to detect and analyze defects. It offers fast and reliable detection results that can generate highly informative defect maps and images. It also includes a range of features that can be customized to ensure accuracy and precision. With its high-resolution imaging and image processing capabilities, 2367 is ideal for semiconductor and mask making industry.