Used KLA / TENCOR 2367 #9029088 for sale
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ID: 9029088
Wafer Size: 12"
Vintage: 2004
Brightfield inspection system, 12"
Install Type: Stand-Alone
Cassette interface:
(2) Asyst 300mm FIMS LPs
(2) AdvanTag SW CID, G4
E84 for OHT w/PIO for G4
E40/E94 HW support
Pre-aligner
Main unit:
Brooks robot
BB visible pixels (um): 0.62, 0.39, 0.25
BB/I-Line/G-Line UV pixels (um): 0.20, 0.16, 0.12
Edge contrast
Array & random modes
High mag review optics
High resolution review CCD
Anti-blooming TDI
IS Station
Status lamp (R, Y, G, B, audible)
1600 MPSS image computer
Operating system: Win 2000
Application SW ver: 10.4.507.0.5
GEM/SECS & HSMS
Power line conditioner
Remote power EPO
Facility requirements:
CDA
Vacuum (house)
Power (main): 208 VAC, 16 A, 3 phase, 5-wire (WYE), freq 50/60Hz
2004 vintage.
KLA / TENCOR 2367 Mask and Wafer Inspection Equipment is a production metrology platform designed to support various defect inspection, overlay, and CD metrology applications. The system includes a brightfield illuminator with both reflected and transmitted light classes, a digital camera, and a powerful nano-scale optical alignment capability. This unit is engineered to accommodate all sizes of masks and wafers from 2 to 12-inch mask and wafer sizes with a range of throughput up to a maximum input resolution of 50 microns. KLA 2367 Mask and Wafer Inspection Machine meets the industry's demanding needs for process control and total defect inspection through a combination of advanced design and performance features. The tool offers very fast automated machine alignment and enable the capture of high-resolution, full-field images using a brightfield illuminator with both reflected and transmitted light classes. It also features automated defect review with pattern classification and algorithmic defect review and defect classification with both wafer CD and contact mask data as input compared to simulation results. The advanced optics of TENCOR 2367 minimize variation in the CD and overlay measurements from chip-to-chip and over the course of the production run. In addition, the asset's alignment/focusing capabilities enable precise placement of the mask or wafer as well as alignment within each shot. The integrated pattern recognition software enables fast mask wafer defect classification and algorithmic defect review with wafer CD and contact mask data as input. 2367 model also works with an array of software applications and tools for image acquisition and integration, sample/process analysis, data management, and reporting. Each of these applications provides an integrated capability to collect, analyze, and communicate the objectives of each wafer metrology project. The software is designed to address the customer's requirements for portability, flexibility, and scalability. KLA / TENCOR 2367 is designed to be a reliable and cost-effective metrology solution for advanced technology nodes. The equipment provides intelligent operation with no manual intervention and automated real-time feedback and diagnostics to ensure optimal measurement performance. The integrated system is designed for rapid set up and seamless transitions from one wafer to the next, making it easy to produce high-quality and robust inspection results.
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