Used KLA / TENCOR 2370 #9083809 for sale

KLA / TENCOR 2370 mask and wafer inspection equipment is a valuable tool for mask and wafer manufacturers. The system utilizes advanced optical technology, image comparison, and pattern recognition to identify defects and accurately inspect wafer images for both functionality and yield. The unit is designed to inspect a variety of substrates including photomasks and wafers ranging in size from 1 to 12 inches. It utilizes a scan head with a high-resolution CCD camera and powerful LED illumination machine to capture images with precision and clarity. The images are then analyzed using sophisticated software algorithms which detect the presence of defects and compare images to a reference database. This allows for faster and more accurate inspection of both wafer and photomask images. The tool also features integrated automated metrology and CD/NSL measurement capability. This enables the detection of particles, line edge and line width roughness, as well as overlapped and isolated lines. This helps mask and wafer manufacturers ensure their product meets industry standards for accuracy and functionality. Additionally, KLA 2370 has a powerful edge detection engine which allows for precise alignment of substrates and increased accuracy in defect detection. This helps increase yield and reduce costs associated with scrap. The asset also utilizes an automated vision camera to select targets from up to four positions, allowing for multiple substrates to be inspected at a time. Overall, TENCOR 2370 provides an invaluable set of tools for mask and wafer manufacturers. Its high-precision image capture and automated metrology help ensure that substrates are inspected thoroughly and accurately. Additionally, its automated vision camera, powerful edge detection, and multiple substrate scanning capabilities make it ideal for high-throughput production with minimal yield loss.