Used KLA / TENCOR 2370 #9184317 for sale

KLA / TENCOR 2370 is a next-generation mask and wafer inspection equipment that offers high resolution inspection for lithography reticles and wafers. KLA 2370 offers superior imaging capabilities using advanced laser illumination sources, including a variable spot laser and brightfield illumination. The imaging system allows for inspection of the entire field of view from low-voltage to ultra-high-resolution images. The unit also offers automatic pattern recognition and defect classification capabilities, enabling the rapid and accurate identification of minute defects invisible to conventional technologies. TENCOR 2370 offers dual-stage image processing and analysis capabilities that allow for faster wafer inspection. The first stage of the analysis utilizes proprietary algorithms to compare the scanned pattern to the reference pattern, enabling rapid imaging at various resolutions. The second stage of the analysis utilizes a combination of custom-designed phase-shifted algorithm and a pattern classification engine to detect and classify defects. This combination of techniques ensures the highest accuracy in defect identification. 2370 is designed for use in both production and development environments. It supports a wide range of substrates, including glass substrates, gallium arsenide (GaAs) and lithography reticles. KLA / TENCOR 2370 machine is designed for easy integration with leading lithography systems and can be used in conjunction with metrology, inspection and defect review equipment. The tool offers advanced automation capabilities, as well as advanced reporting and analytics. KLA 2370 asset offers a wide range of image capture and analysis features, which allow for faster turnaround times and lower defect coverage rate. It also enables further defect reduction through advanced defect-reduction algorithms. Additionally, the model offers improved scalability and flexibility in support of a variety of production requirements. Overall, TENCOR 2370 is an advanced and powerful equipment offering superior image quality, rapid wafer inspection and unparalleled defect classification accuracy for mask and wafer inspection. The system is designed for ease of integration and is scalable for both production and development environments. The unit's advanced defect-reduction algorithms allow for improved junction accuracy and defect coverage rate.