Used KLA / TENCOR 2371 #9313879 for sale

KLA / TENCOR 2371 is a top-of-the-line mask and wafer inspection equipment that provides comprehensive analysis and characterization of semiconductor patterns. The system combines advanced optics, sensors, signal-processing electronics, and software to produce images with high accuracy, repeatability, and flexibility. It is used in the fabrication and inspection of high-precision semiconductor and integrated circuit devices as well as in flat panel display fabrication. KLA 2371 uses a combination of lasers, imaging sensors, and optical components to scan, recognize, and process patterns present in the material being inspected. A computer-aided inspection (CAI) unit recognizes patterns in the scanned material and compares them to previously stored reference models. The machine also utilizes a powerful software to map out pattern quality, defects, line width, and other parameters that are inspected. The tool employs a high-resolution optical microscope, which is capable of sub-micron imaging. It is integrated with a high-speed galvanometer-based optical asset, providing horizontal and vertical automatic stage scanning capability. The model offers an advanced feature inspection capability that enables detection of sub-micron sizes of defects, and it can also identify particles and residues. TENCOR 2371 is capable of both destructive and non-destructive testing. The equipment is well-equipped with various features such as multiple pattern recognition algorithms, automated pattern recognition software, automated fault detection and classification, post-processing to help identify systematic failures due to material stress, and a powerful graphical display. Additionally, its programming software provides users with the ability to do multiple, user-defined inspections, including color contrast, mask alignment, shot-to-shot scanning, overlay verification, axis tilt, and image magnification. 2371 is designed for the production environment and offers a comprehensive solution for the inspection of semiconductor masks and wafers with multiple paths. It is fully configurable to meet the needs of complex, specialized procedures, and it can be easily integrated with other equipment on the line. All in all, KLA / TENCOR 2371 system provides a comprehensive solution for the inspection of semiconductor masks and wafers with multiple paths. With its powerful optics, sensors, signal-processing electronics, and software, it gives users the flexibility to achieve precise and repeatable results for their mask and wafer inspection tasks. The unit is applicable in all kinds of production and inspection environments, and it can help reduce time, cost, and defects.