Used KLA / TENCOR 238 #293595764 for sale

KLA / TENCOR 238 is an advanced semiconductor mask and wafer inspection equipment designed to inspect devices such as integrated circuits (ICs) and other components used in the manufacturing of electronic devices. The system is designed to identify and inspect defects in the lithographic mask and in the printed wafer patterns. KLA 238 utilizes a state-of-the-art pattern-recognition unit to identify specific markings, providing a high resolution image that can be used to detect diffractions and other visible features that can be used to analyze the accuracy of a mask or wafer pattern. It also features a wide range of high sensitivity filters to help eliminate noise and interference from the imaging environment. The machine utilizes advanced optics technology to provide reliable images of the mask pattern or wafer pattern with a high resolution output. The tool also offers a high-speed autofocus mechanism that can detect minute details in the imager's field of view. The asset utilizes a variety of light sources to capture data, including UV, blue and green LEDs as well as lasers. These various light sources provide an expanded range of contrast capabilities, allowing the model to identify subtle mask or wafer defects. TENCOR 238 also incorporates multiple-field imaging and magnifying capabilities, enabling it to inspect up to 20 different fields of view at a time. The equipment also has the ability to store a wide range of analyzed images, allowing users to view, store and archive the images for archival or future reference. In addition, 238 features a number of features that ensure accurate results. One such feature is an improved laser focusing mechanism that allows the system to accurately identify small defects in the mask and wafer patterns. This feature also helps reduce false alarms, and reduce the cost of achieving accurate results. The unit also has flexibility to adjust the amount and type of light used for the imaging process, allowing for improved results with a variety of imaging conditions. Finally, the machine was designed with a number of safety features, reducing the potential for damage or harm to operators and equipment. All internal lenses are self-cleaning, making them easier to use and less likely to cause problems. Additionally, the tool is designed to minimize issues with accidental burns or hot spots, further reducing the potential for damage to users or equipment. All in all, KLA / TENCOR 238 is an advanced mask and wafer inspection asset designed to provide accurate images with improved sensitivity and accuracy. The model is well-suited for quality assurance and production operations, providing high resolution images of both masks and wafers quickly and accurately. The equipment's advanced features and safety measures make it an ideal tool for inspecting high-end technology in semiconductor devices.