Used KLA / TENCOR 239 / 219 #76226 for sale

KLA / TENCOR 239 / 219
ID: 76226
Vintage: 1989
Mask inspection systems KLA 20 (RIA1) Data server (2) PCBs 1989 vintage.
KLA / TENCOR 239 / 219 is a mask and wafer inspection equipment designed for optical inspection of semiconductor wafers. The system features an advanced, high resolution digital imaging unit coupled with an array of powerful image processing algorithms. The package includes custom software applications to streamline defect detection including automated defect review (ADR) and 2D morphology. The ADR tool offers four defect types inspection with fast reaction times and accurate defect location through its multiple pass method. The 2D morphological algorithm uses neuro-fuzzy computing techniques to detect subtle pattern variations. The machine's imaging array has a large pixel size of 512 x 1024, with a 175 x 250 mm field of view which captures high quality images. The images are enhanced by the integration of a crossed grating filter for improved brightness and contrast. There is also an advanced, monochrome color grading mode for improved false color rejection and edge detection. KLA 239 / 219 package is built on an intuitive Windows operating tool, allowing for ease of use and quick adaptation. It is designed to integrate with existing mask inspection tools, such as KLA own Contura Inspection Suite. Key features of the package include pattern type recognition, defect review automation, sub-pixel mask alignment, laser scanning, overlay analysis and much more. The design of the asset has been optimized for high performance in a wide range of lithography elements, including contactors, barrier layers, and passivation materials. The advanced algorithms and powerful processor architecture provide fast operation, making it a cost-effective solution to stay on top of today's high manufacturing demands. TENCOR 239 / 219 is exceptionally well-suited to wafer and mask inspection in the semiconductor industry, where identification of defects and high-resolution, high-accuracy imaging are critical to ensure product quality. With its compact design and intuitive, user-friendly interface, this model is a great choice for any semiconductor manufacturing facility.
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