Used KLA / TENCOR 2435 Viper #293775231 for sale

ID: 293775231
Wafer Size: 12"
Vintage: 2006
Macro inspection system, 12" Wafer transfer robot (3) Loadports 2006 vintage.
KLA / TENCOR 2435 Viper is a high-performance mask-and-wafer inspection equipment designed to detect and characterize defects present on the mask and semiconductor wafers. This system offers a combination of both high-resolution imaging and advanced metrology capabilities to ensure success in process control and quality assurance. KLA 2435 Viper operates by combining advanced laser based optical critical dimension (OCD) with advanced detector technology. The laser interface provides high-resolution images of the mask and wafer with accuracies down to 0.02um. This results in a high degree of precision which allows for the most accurate pattern measurements and analysis. The integrated detectors allow for a broader range of inspections, such as defective die inspection, dark-field imaging, and contamination detection. Additionally, due to its increased sensitivity, TENCOR 2435 Viper also offers the capability of surface roughness metrology. 2435 Viper comes with an intuitive graphical user interface, allowing for easy access to the unit's features and settings. Additionally, its modular design allows for easy reconfiguration - enabling users to quickly switch between inspections such as wafer and mask verification. Moreover, KLA / TENCOR 2435 Viper supports a range of software such as the Automated Defect Recognition (ADR) machine - enabling improved detection and reporting capabilities for users inspecting masks and wafers with complex patterns or fine pitch devices. The tool also comes with a variety of advanced analysis tools, such as the Calibration and Calibration Offline (CCO) module. This module offers advanced pattern recognition, allowing the user to automatically monitor patterns on the mask or wafer and guarantee continuous quality control. In summary, KLA 2435 Viper is a highly-advanced mask-and-wafer inspection asset designed to improve quality control and yield success. This model combines high-resolution imaging with advanced metrology capabilities and an intuitive graphical interface. Moreover, the equipment supports a range of advanced analysis tools, enabling improved detection and accuracy when comparing the sample to pre-defined standards.
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