Used KLA / TENCOR 2435XP Viper #9411428 for sale

ID: 9411428
Wafer Size: 12"
Vintage: 2004
Macro inspection system, 12" 2004 vintage.
KLA / TENCOR 2435XP Viper is a mask and wafer inspection equipment designed for the latest semiconductor lithography for better process control and performance. The innovative technology incorporated in the system allows for the inspection of both photomasks and wafers with state-of-the-art resolution, ultra light sensitivity and error detection capabilities. KLA 2435XP Viper utilizes an automated vision inspection unit that enables sub-nanometer resolution and superior imaging. Its built-in optical character recognition capability allows for the detection of very small defects as small as 0.1 micron and enables a very fast inspection speed and low false report rate. The machine also features a dual camera tool design, delivering 2x the resolution and 4x the field of view than the previous model. TENCOR 2435XP Viper has a robust user interface and offers full control of all inspection parameters. It can be used to inspect both opaque and transparent materials with a variety of imaging modes. Digital image processing tools are built-in as well, allowing for mask pattern measurements and an automatic defect classification asset. The machine also includes a powerful set of analysis functions such as on-the-fly measurement; 3D auto-scaling; high precision edge detection for complex designs; and user-defined region of interests for automated edge scanning. 2435XP Viper is equipped with a standard light source with adjustable intensity and wavelength coverage from UV to VIS. It also provides the flexibility to use customized light sources, including UVA and Near-IR. A wide range of optional accessories are available as well, such as a motorized stage, filters and more, plus a touch screen to simplify inspection setup and parameter adjustment. Overall, KLA / TENCOR 2435XP Viper offers a reliable and cost-effective solution for mask and wafer inspection that helps ensure quality control throughout the entire manufacturing process. It offers superior performance, accuracy and coverage of extremely small defects without sacrificing speed, allowing users to make fast and accurate decisions in a timely manner.
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