Used KLA / TENCOR 2551 #293616226 for sale

KLA / TENCOR 2551 Mask and Wafer Inspection equipment is an automated optical inspection system designed to identify defects in a variety of semiconductor masks and wafers. This unit utilizes a combination of optics, a motion machine, and advanced pattern recognition algorithms to detect and identify defects in the mask and wafer backlighting. KLA 2551 can provide defect detection support for the full range of mask and wafer production technology, ranging from simple aluminum to more complex multi-metal, multi-layer resistor and capacitor structures. TENCOR 2551 inspection tool is composed of three primary components: a projection asset, an XYZ motion model, and a light source. The projection equipment consists of three lenses: an objective lens, a die-to-chip projection lens and a field projection lens. The objective lens projects the image from the die onto the chip, while the projection lens is used to project the image from the mask onto the chip. The field projection lens, in turn, is used to project a larger image from the entire wafer onto the chip. The scanner can scan a full-field image of the wafer at user-defined resolutions and compare it to a standard mask pattern. In this way, 2551 can detect and identify defects quickly and accurately. Additionally, it can be used to rapidly and accurately detect pattern-dependent errors caused by incorrect film thickness, bending, mis-registration, and other issues. The motion system is composed of a two-axis linear stage and two rotary stages. This allows the projection unit to efficiently and accurately reposition itself to the desired position to take measurements and inspections. The light source can be chosen to match the signal range and signal strength for different materials. KLA / TENCOR 2551 is equipped with an advanced software suite that makes use of image processing and artificial intelligence (AI) algorithms to detect and identify defects. This includes algorithms for identifying and categorizing defects by size, shape, pattern, and orientation; for comparing defects to their reference points; for identifying defects through pattern recognition; and for determining their true nature and location. Additionally, the machine is capable of rapidly and accurately generating a statistical report for each defect found. In summary, KLA 2551 Mask and Wafer Inspection tool is a highly advanced, automated inspection asset designed to quickly and accurately detect and identify defects in a variety of semiconductor masks and wafers. It features a combination of optical elements, advanced motion and light sources, and AI-powered software algorithms to ensure the most accurate results.