Used KLA / TENCOR 2552 #293591921 for sale

KLA / TENCOR 2552 is an advanced mask and wafer inspection equipment designed to detect the smallest defects in integrated circuit fabrication. It features an innovative vision system that integrates two tools into one unit: scatterometry and line-of-sight imaging. Scatterometry uses light to measure the material in a mask and identify potential defects, while line-of-sight imaging helps quickly identify larger defects such as etching or residue. With its high speed, high resolution, and high accuracy, KLA 2552 is an industry-leading tool for mask and wafer inspection. TENCOR 2552 is an inline machine that inspects each mask and wafer during the fabrication process. It features two digital cameras and two beam extractors that capture and analyze images of the patterns on the mask or wafer. The tool's innovative vision asset enables detection of both physical defects and photomask defects at very high accuracy. The high-resolution cameras used in the model allow for precise defect localization and measurement. 2552 is designed to inspect both photomask and wafer defects with a single equipment. It is capable of analyzing both die-level and wafer-level defects with a high degree of accuracy. The system can detect defects as small as 0.3um in size, and can identify contamination and prevents its spread. Additionally, the unit can alert users to the presence of anomalies or aberrations in the photomask images. KLA / TENCOR 2552 is equipped with intelligent defect detection, which eliminates manual inspections and makes defect detection much faster. It is also equipped with image feature extraction technology, which allows for detection of layer-level defects and aberration in the masks. With its intelligent defect detection algorithms and high-speed inspection capabilities, KLA 2552 is capable of finding the most subtle defects while maximizing throughput. TENCOR 2552 is an advanced mask and wafer inspection machine designed to deliver high throughput and high accuracy. Its innovative vision tool and high-resolution cameras quickly and accurately identify even the smallest defects in mask and wafer fabrication. Its intelligent defect detection algorithms and image feature extraction technology make it an invaluable tool for any semiconductor fabrication plant.