Used KLA / TENCOR 2552 #9083783 for sale

KLA / TENCOR 2552
ID: 9083783
Wafer inspection systems.
KLA / TENCOR 2552 is a state-of-the-art mask and wafer inspection equipment designed for semiconductor production. It offers leading-edge performance in advanced imaging and automated, highly sensitive defect inspection across a broad range of semiconductor materials, sizes, and complexities. KLA 2552 system also provides a comprehensive software package for automating defect classifications, data collection, trend analysis, and reporting, making it an essential tool for increasing process quality and throughput. TENCOR 2552 unit's advanced optical machine allows for rapid imaging of mask and wafer surfaces, with smooth image transfer and parallel processing for higher speeds and line rates. This laser-scanned optical architecture also features a short spot-size laser that minimizes motion artifacts, providing higher resolution, image flexibility, and illumination angles for testing and inspecting extremely small defects. 2552 tool contains a range of diverse technologies, including advanced defect imaging algorithms for identifying small defects and non-differentiating particulates. It also supports a variety of illumination techniques, such as polarized, contour, edge detection, and pattern recognition for high resolution imaging at various angles and illumination levels. The asset also provides a flexible data acquisition model for collecting defect information from various points across the surface of the wafer or mask. Finally, the equipment is equipped with a powerful software suite for managing and analyzing the collected data, providing trend analysis, defect tracking, and statistical process control to ensure high yield and process optimization. Overall, KLA / TENCOR 2552 is an advanced mask and wafer inspection system that offers superior performance in combination with sophisticated software tools. This unit provides high-resolution and repeatable imaging, accurate defect identification, data collection, and process control, making it an essential tool for both production and research.
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