Used KLA / TENCOR 259HR #293635801 for sale

KLA / TENCOR 259HR is a powerful and highly efficient mask and wafer inspection equipment designed to provide a complete solution for the production of advanced process nodes. KLA 259HR is the latest addition to KLA range of automated, digital distribution mask and wafer inspection systems. TENCOR 259HR provides a high-accuracy optical imaging system that is capable of inspecting a wide range of wafers, masks and other microelectronic components for defects, non-uniformity and morphology. The unit is optimized for process nodes from 8+ to 16+ nanometers and has a 110 mm field of view (FOV). It has a very high-resolution sub-micron imaging machine and a standard-definition video inspection tool. 259HR can detect anomalies from 0.5 to 10 μm. The imaging asset is equipped with algorithms for multiple pattern types, enabling detection and mapping of defects and particles. The model also provides sophisticated edge and topography imaging capabilities. KLA / TENCOR 259HR incorporates an extensive library of image processing algorithms, allowing it to perform pattern recognition and identify a wide range of defects, including scratches, pitting and dust particles. The equipment is also capable of characterizing complex patterns, such as pitch, pitch variation and edge integrity, making it a powerful tool for identifying lithographic errors, as well as tracking mask misalignment and other process-related effects. The system also includes a range of advanced features, such as real-time global monitoring, dynamic imaging and remote diagnostics. KLA 259HR can store over 200 images per wafer, minimizing time and effort in defect inspection, analysis and review. It is also compatible with several industry-standard data formats to ensure fast, efficient, and reliable integration into existing mask and wafer production lines. Overall, TENCOR 259HR is a highly advanced mask and wafer inspection unit designed to provide a complete solution for the production of advanced process nodes. Its sophisticated imaging machine and array of processing algorithms make it an ideal choice for automated monitoring and defect inspection. 259HR is capable of detecting and characterizing a wide range of defects and can store over 200 images per wafer, making it a powerful tool for lithographic process control and quality assurance.