Used KLA / TENCOR 2608 #9291479 for sale

KLA / TENCOR 2608 is a state-of-the-art Mask and Wafer Inspection Equipment, designed to provide superior imaging, analysis, and defect detection capabilities to high volume manufacturing line. KLA 2608 system features built-in algorithms specifically tuned for critical applications such as wafer mapping and particle recognition, high-definition imaging, full-field inspection and comprehensive data analysis. TENCOR 2608 unit includes a multi-channel beam optics machine, capable of collecting images up to eight-million-pixels in resolution. A transmission electron microscope (TEM) can be used to extract from the underlying structure, offering resolutions up to 3-million-pixels. The tool also incorporates 4-kV and 10-kV high-voltage electron beam sources, providing unprecedented imaging and analysis capabilities. The asset utilizes an advanced high-resolution video-rate imaging model, which ensures consistent imaging capabilities across a range of inspection modes, including die/feature recognition, defect detection, full-field imaging and wafer mapping. A suite of proprietary software tools provides unparalleled accuracy and sensitivity for defect detection, including integrated circuit (IC) inspection, mask alignment, photomask inspection, wafer defect analysis, and gate pattern recognition. 2608 equipment is capable of simultaneously performing multiple tasks, such as particular recognition and defect localization. Its advanced software algorithms can customize and adjust imaging parameters to optimize performance for multiple application types. Additionally, a variety of integrated sensors, including a remote controlled joystick, and a direct-drive motorized stage, allow users to manually control the movement and the focus of the imaging system. Designed for use in high-volume manufacturing and process control environments, KLA / TENCOR 2608 unit is robust and field-proven. Durable components and the machine's longevity make it ideal for use in mission-critical applications. The tool also features a modular design, allowing suppliers to customize and upgrade the asset over time. KLA 2608 model provides reliability and performance for critical manufacturing applications. Its integrated sensor suite, powerful onboard algorithms, and high-resolution imaging technologically provide an efficient and cost-effective tool for mask and wafer inspection in high-volume production.