Used KLA / TENCOR 2800 #9189035 for sale

ID: 9189035
Wafer Size: 8"-12"
Vintage: 2007
Inspection systems, 8"-12" 1600pps Mercury Image computer Minimum pixel: 90nm DUV 750mw Lamp OS: Win2000 / DELL 2800 2007 vintage.
KLA / TENCOR 2800 is an automated, high-sensitivity mask and wafer inspection equipment for the precision optical inspection of photomasks and reticles used in semiconductor manufacturing. KLA 2800 system uses powerful optics, advanced image processing techniques, and automated inspection techniques to rapidly scan reticles and masks for defects, particles, contamination, and other irregularities. With its innovative NIR detect feature, TENCOR 2800 can detect the smallest defects and particles at high speeds and with high precision. 2800 features a patented Active Probe (AP) tool, which is an advanced scanning technology that enables the unit to inspect highly intricate areas such as smaller features, embedded materials, and solder joints. The machine also has a Self-Targeting Focus (STF) feature, which automatically focuses on the substrate surface for clear images and accurate measurements. KLA / TENCOR 2800 is designed to help semiconductor manufacturers maximize yield and product quality. It enables them to quickly and accurately detect defects to prevent bogus defect calls. The tool also provides fast and reliable E-beam direct write part placement accuracy and tracking to allow higher speed direct write processes. KLA 2800 features an intuitive user interface and includes an automated data collection, analysis and reporting feature. It can generate custom reports on the quality and condition of parts, images of the defects, data analysis tables, and more. TENCOR 2800 has been proven reliable in a wide range of production environments and provides the highest quality inspection results. It is one of the most advanced mask and wafer inspection systems on the market today and is ideal for semiconductor and other microelectronic device manufacturers.
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