Used KLA / TENCOR 2800 #9216009 for sale

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ID: 9216009
Wafer Size: 12"
Vintage: 2007
Inspection system, 12" (2) Loadport YASKAWA Robot 2007 vintage.
KLA / TENCOR 2800 mask & wafer inspection equipment is designed to provide high throughput and high accuracy on-site semiconductor process control. KLA 2800 leverages 3D inspection and advanced analytics to continuously monitor and improve process success. TENCOR 2800 wafer inspection system is built to quickly and accurately evaluate fab process conditions including mask dimension and position (CDM, DPM) and reflective film topography. The unit utilizes chemical and physical characterization techniques to measure critical dimensions and film thickness of photoresist and deposition layers on wafers. It features an automated workflow, combining both optics and hardware to achieve high repeatability and speed. 2800 machine is equipped with several hardware components, most notably a Split-Domino Mask Aligner, a high resolution measurement tool, and a vision tool incorporating both morphological and other pattern recognition algorithms. The 3D-inspection tool enables fast CD/OPC measurement and analysis. Additionally, KLA / TENCOR 2800 wafer inspection asset has an integrated metrology chamber which extracts and analyzes physical characteristics of film layers. This helps to ensure that the optical parameter measurements of the substrate layers adhere to customer-specific specifications. KLA 2800 mask & wafer inspection model offers a powerful suite of advanced analytics and data mining capabilities to customers. This includes the ability to detect process anomalies and track key parameters over time to detect trends for process improvement. Users can set customized rules for material layer defect detection, maximize process consistency across wafers, and automate signal classification. TENCOR 2800 Mask & Wafer Inspection Equipment ensures accurate and reliable process characterization at higher speeds than ever before. It offers industry leading process yield, accuracy and repeatability.The system has revolutionized the semiconductor fabrication process and enabled fab operators to optimize their processes for long-term success.
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