Used KLA / TENCOR 2810 #9169784 for sale

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ID: 9169784
Wafer Size: 12"
Vintage: 2008
Bright field defect wafer inspection system, 12" Equipment status: In-line Type: Non SMIF Automation online components: GEM Wafer type: Notch at 6 o'clock Software OS: Windows Software: Y2K Competion 2008 vintage.
KLA / TENCOR 2810 is a mask and wafer inspection equipment designed for precise, automated inspection of photomasks and wafers with defect-critical features. This system combines excellent imaging performance, advanced metrology capabilities with user-friendly software, providing a solution tailored for the demanding requirements of semiconductor inspection and review. KLA 2810 incorporates the latest hardware and software technologies to provide reliable and repeatable data, while offering precise positioning and strobe alignment to ensure defect-free starts and precise operation. The unit is easy to set up and operate, and its automated measurement systems, optical pattern recognition, and advanced defect review capabilities allow quick and accurate verification of even the most sophisticated wafer designs. TENCOR 2810's 5-axis configuration allows access to all of the main components, providing precise and repeatable registration of the mask. The machine includes dual-stage binocular stereo viewing, enabling precise and repeatable imaging across complex structures and features that are difficult or impossible to view in a traditional microscope. 2810 utilizes the latest illumination technology, including darkfield, oblique angle, and KLA patented LED lighting tool, which reduces light flare and enhances defect visibility. It can quickly inspect large areas and identify the location of parametric defects with the help of its on-board stepper pattern recognition algorithms. Additionally, KLA / TENCOR 2810 is capable of inspecting the photosensitive layers of the mask, thus reducing false detections. KLA 2810 also includes a comprehensive suite of software tools, including TENCOR defect data management software, allowing for analysis and review of data from multiple sources. The asset also features a powerful user interface for collaboration and defect review. With its innovative design, advanced imaging capabilities, versatile software tools, and user-friendly operation, TENCOR 2810 mask and wafer inspection model is an invaluable tool for semiconductor defect review and analysis.
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