Used KLA / TENCOR 2810 #9227348 for sale

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ID: 9227348
Wafer Size: 12"
Vintage: 2009
Inspection system, 12" Sub process: Bright inspection Material / Chemical: OX/Si Operating system: Windows SMIF / FOUP Safety standard: SEMI S2-0703 (2) ASYST Isoport Load ports YASKAWA Transfer arm (Robot) KLA / TENCOR Chamber Main body EFEM UI Power unit Blower IMC Missing parts: (2) TDI FEC (2) 0102810-002 (E) Assy, Galil DMC-2183 SAC SABB AMP SS 16 LS 002 (E), ESTED, SERIA SMAC Board (2) Auto focus boards PS1 PS2 X-AMP (2) Y-AMP Z-AMP (2) FRU Assy PCA Active ISO AMP V3 5XX 2009 vintage.
KLA / TENCOR 2810 is a state-of-the-art mask and wafer inspection equipment that can detect defects in wafers and masks and accurately measure the dimensions, shapes, and placement of features on the wafer. KLA 2810 is designed to meet the high accuracy requirements of today's semiconductor device manufacturing. TENCOR 2810 system utilizes a 10X microscope to precisely measure and identify defects in a semiconductor feature size down to 1/4 micron. Highly advanced algorithms in the unit enable it to find and distinguish defects from perfectly formed features with remarkable accuracy. The machine can scan and measure up to 3 chips simultaneously, allowing for an extremely fast throughput rate. 2810 is capable of detecting both electrical and physical defects including particles, voids, gate and contact shorts, dislocations, voids, line-widths and line-edge roughness, via sidewalls, and shape derivatives. The tool is also capable of both darkfield and brightfield imaging, as well as scatter imaging, which enables it to detect defects below the optical resolution limit. In addition to the advanced optical detection capabilities of KLA / TENCOR 2810, the asset is also capable of performing a wide range of measurements including overlay, pitch, width, length, and area. The model also provides an interface to an external automatic defect review (ADR) equipment, which enables KLA 2810 to classify and classify defects quickly and efficiently based on predetermined rules and patterns. TENCOR 2810 is a versatile, high-precision mask and wafer inspection system that is designed to detect and measure defects with unsurpassed accuracy and repeatability. The unit is capable of detecting and measuring a wide range of electrical and physical characteristics in a single, fast, automated process. Thanks to its advanced algorithms and imaging, 2810 can detect defects down to a 1/4 micron level while providing repeatability by repeating the verification and measurement processes with a single click. This makes KLA / TENCOR 2810 a valuable tool in the semiconductor manufacturing process.
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