Used KLA / TENCOR 2820 #9233277 for sale
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ID: 9233277
Wafer Size: 12"
Vintage: 2010
Wafer inspection system, 12"
Process: BTFLDINSP
Integrated mini environment included
Carrier:
Wafer calibration kit includes DSW and shiny
Hermos (2 CID Devices)
Advantag (2 CID Devices)
KEYENCE BCR Single wire (2 CID Devices)
Interlocks:
Safety interlock for open panel
Safety interlock for lamp
FEC CPU:
Intel PENTIUM 4: 3.0GHz
RAM: 2GB
DELL CPU:
Intel XEON 4: 3.4GHz
RAM: 2.48GB
DVD-ROM
Mouse
Keyboard
HSMS / GEM SEMI E37 Interface
HSMS (E5 / E30 / E37)
GEM / SECS Automation interface (E4 / E5 / E30)
SEMI E84
SEMI E116
Hokuyo sensors:
Overhead transport (OHT)
Remote guided vehicles (RGV / AGV)
Auto switch for dual use environments
IDM
Inline ADC
ITF
Load port UI
MDAT
Mixed mode
NFS Data transfer
OME
OSTS
RICO
Spatial analysis
Patch images 64 x 64
Pixel perfect
RBB
RBMT
Sensitivity tuner
NPA
Partial die
Interface
Data transfer
DVD-R
Ethernet
Hardware optics
DUV Blue band \ Broad band \ Deep band pixels (120 nm, 160 nm, 200 nm, 230 nm, 80 nm, 90nm)
UV G-Line / I-Line pixels(120 nm, 160 nm, 200 nm, 230 nm, 80 nm, 90nm)
UV GHI-Line pixels(160 nm, 200 nm, 230 nm, 80 nm, 90nm)
Edge contrast plus
Carrier I.D HW
High performance edge contrast
Bright field
DEC Vertical
DEC Horizontal
Low sigma
HPS-F
HPS-M
VPS-F
VPS-M
Vw: 25 in Hg
CDA: 13.6 Sft³/min
P-N2: 12.2 Sft³/min
Exhaust: 263 ft³/min
Exhaust: 3000 ft³/min
Exhaust: 2600 ft³/min
Operating system: Windows 2000
Power requirement: 2V, 4W-N, 24 kW
2010 vintage.
KLA / TENCOR 2820 is a state-of-the-art mask & wafer inspection equipment designed to provide highly reliable and accurate circuit measurements and defect detection for a variety of electronic components. KLA 2820 is based on a combination of laser interferometry, electron beam imaging, and advanced image processing techniques to provide a comprehensive set of inspection capabilities in a single package. TENCOR 2820 offers a high-resolution scanning system and image processing capabilities that offer superior resolution, contrast, and sensitivity. The laser interferometer used in 2820 allows for highly accurate measurements of both feature size and registration, which is especially important for mask & wafer inspection. The electron beam unit can be used to inspect features in devices such as memory chips and microprocessors, which require higher resolution and image contrast. KLA / TENCOR 2820 also includes several software tools designed to automate and simplify the mask & wafer inspection process. The AutoAlign feature automatically compensates for minor positional and size variations between masks or wafers, and the automated diagnostic tool allows users to quickly and accurately identify abnormal regions. Additionally, the integrated image processing engine can detect defects in both silicon and plastic components, providing the operator with an intuitive interface as well as sophisticated image processing techniques. KLA 2820 utilizes the latest in semiconductor inspection technology to ensure maximum accuracy and precision when inspecting semiconductor devices. From embedded memory to advanced ICs, and even for unique mask & wafer requirements, TENCOR 2820 is designed to provide the performance and speed required for today's high-speed and complex production environments. The machine also features built-in image streaming and feature recognition capabilities, as well as a variety of automatic and manual image processing functions. Designed for fast, reliable, and accurate results, 2820 Mask & Wafer inspection tool is an ideal tool for ensuring the best quality product in the most efficient way. With the ability to inspect both silicon and plastic components, advanced image processing capabilities and comprehensive diagnostic tools, and a reliable and accurate laser interferometer, KLA / TENCOR 2820 is a versatile and efficient choice for all mask & wafer inspection needs.
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