Used KLA / TENCOR 2920 #9375410 for sale

KLA / TENCOR 2920 is a mask and wafer inspection equipment that provides clear and accurate images of the critical features on masks and wafers and defect analysis. It has a high-resolution digital imaging system and state-of-the-art software for image comparison and analysis. The unit offers superior sensitivity and accuracy for mask and wafer inspection with its proprietary RapidImageSource™ imaging machine coupled with advanced multi-frequency scatter-scanning optics. It can be used for automated inspection of critical features and defects for post-etch patterned wafers, photomasks and illuminated mask targets. KLA 2920 is equipped with a high-resolution digital imaging tool including an image acquisition asset, image comparison and analysis software, and a positioning model. The imaging equipment utilizes a unique scattering beam of light and a highly sensitive CCD camera to capture clear and accurate images of the critical features on masks and wafers. The multi-frequency scatter-scanning optics system allows the imaging unit to acquire images at a resolution of 40 nm. This machine is optimized to detect small defects and determines their size, shape, location and orientation. The analysis software can then perform pattern recognition, image enhancement, and automatic defect classification. The tool also has an advanced positioning mechanism for accurate sample scanning. TENCOR 2920 also has enhanced process control capabilities. It can monitor the entire process from start-up to diagnostic testing, improving throughput, repeatability, and quality control. The asset can generate detailed reports automatically and provide real-time data for process optimization and corrective action. 2920 is a reliable and versatile model for mask and wafer inspection. It provides superior imaging capabilities, enhanced process control features, and advanced analysis software for maximum accuracy in defect detection. This equipment offers cost-effective solutions for patterned wafer, photomask and illuminspect mask inspection.