Used KLA / TENCOR 3000P #293610009 for sale

KLA / TENCOR 3000P
ID: 293610009
Wafer inspection system.
KLA / TENCOR 3000P Mask and Wafer Inspection Equipment is an automated advanced imaging system designed to defect wafers and masks at the sub-micron level. This unit is ideal for quality assurance/quality control (QA/QC) in the semiconductor production process and it can detect surface defects, line widths and spaces, overlay errors, and missing features. The machine utilizes high-resolution digital cameras and advanced imaging software, allowing for accurate vision tool placement and layout. The imaging software that KLA 3000P uses provides the dimensional reference points for each inspection and measurements can be taken from any position on the wafer map. This allows operators to easily inspect defects without additional operator input. The asset is also equipped with a range of detachable probes and sensors such as x-ray, optical, and contact inspection for detailed electrical measurements. It also features multi-site and multi-plane inspection, which enables it to acquire actionable information from multiple levels in order to more efficiently inspect and identify pattern errors on both masks and wafers. TENCOR 3000P is designed with a wide variety of performance parameters to allow operators to maximize its potential. These parameters include image magnification and binning, spot exposure, and spot exposure levels. Furthermore, the model's automated software is designed to be flexible and user friendly. It can be programmed to perform multiple measurements at once and to recognize, identify, and report defects approaching micron levels of accuracy. In addition, 3000P equipment includes several safety features such as a backup image archive, allowing operators to immediately locate and address any defects that may have been missed in the inspection process, as well as a user-friendly touchscreen interface for easy navigation. Overall, KLA / TENCOR 3000P is an extremely reliable, advanced system dedicated to providing accurate, detailed and comprehensive mask and wafer inspection for any required application. Its robust design, comprehensive features, and reliable performance make it an invaluable and indispensable part of any semiconductor production process.
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