Used KLA / TENCOR 3905 #9296699 for sale
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ID: 9296699
Wafer Size: 12"
Vintage: 2017
Wafer inspection system, 12"
CIM: GEM/SECS and HSMS
(2) SHINKO Loadports
(2) OMRON RF Carrier ID readers
(2) OMRON V640 V3-2 RF ID readers
Multiple recipe capability
Protocol zones: BEOL, FEOL, HK, MOL, N2BE
PHOENIX Handler
Ion shower
PHOENIX TF 3.0 Kit
Dual loadport pad kit
Pinpoint: 100 nm DLA
Options:
3905 Simulator
Signal tower PHX (RBYG)
FDC
2017 vintage.
KLA / TENCOR 3905 is a mask and wafer inspection equipment used to ensure high quality components by providing comprehensive inspection capabilities at the wafer and mask levels. It is designed to inspect for defects, including particles, particles and shapes, as well as lens degradation effects, with a high resolution of 5μm. It is one of the fastest optical inspection systems commercially available. The system uses a trifocal mirrored telescope that features a three-lens, full-field-of-view in-line view to capture both short and long optical images. The unit is capable of creating brightfield inspection images for wafer inspection, and also side-view darkfield applications for mask inspection. Special features such as GPU-accelerated image processing and camera calibration complements the inspection process. The machine also features a built-in illumination tool that provides the necessary precision illumination for a variety of mask and wafer types. It features an automated exposure control, ensuring the highest quality image and dynamic range. Additionally, the asset comes with a standard threadometer and flat surface, allowing for accurate wafer placement. The model is built with robust software capable of assessing defects with unsurpassed sensitivity and accuracy. It features algorithms to detect contamination on the light beam, and the capability to scan for particles, surface features, topography and lens aberrations. It also serves as an integral step in auditing the alignment of masks with its Tritopograms technology. The equipment can provide quick and accurate technical data, such as mean size and defect rate histograms. Wafer batch traceability is also supported and 256 layers of storage allow for additional information to be added and processed. The system has been independently tested and approved for the most stringent of industry standards and is compliant with industry-standard flat surface gauging. KLA 3905 unit from KLA has the power to help lead the industry in mask and wafer quality control.
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