Used KLA / TENCOR 3905 #9310915 for sale

KLA / TENCOR 3905 Mask & Wafer Inspection Equipment is a cutting-edge tool that is built to detect and debug any material defects on flat substrates during the semiconductor fabrication process. The system is composed of several components which enables measurement, identification, classification, and repair of defects. The unit utilizes a wide variety of technologies and algorithms to ensure high accuracy and performance. The main part of the machine is the diffraction-based optical imaging tool which enables simultaneous visualization of multiple layers within the substrates during inspection process. This asset adopts a wavelength-based, multiple-reflection approach for enabling multi-layered defect detection. It also includes a Patterned Illumination Contrast Model (PICON), which utilizes edge detection and dark field techniques for improving defect localization capability. In addition to this, the equipment also includes software modules for data processing, feature detection, classification, sorting, and reporting. KLA 3905 Mask & Wafer Inspection System integrates a full-spectrum imaging unit which includes multiple optical components, such as a light source, detector, and optical filters to better identify and detect defects. This machine uses an innovative adaptive bright field illumination technique to ensure maximum performance for large area inspections. It also features metric to classify each defect into one of many categories to enhance classification and repair of defects. The tool integrates a new class of real-time imaging techniques to improve the speed of substrate inspection. This includes a Deep Defect Reconstruction which utilizes an advanced deep neural network (DNN) to reconstruct individual defect features. The DNN is able to generate a 3D representation of the defect from a combination of imaging data. This real time imaging technique enables defect identification and sorting to be completed faster - helping to save both time and costs. TENCOR 3905 Mask & Wafer Inspection Asset also includes several auto-focus and zoom optics. It supports a wide variety of resolutions allowing users to better distinguish and analyze single defects. With an appropriate magnification, the model can identify many defects. The equipment also includes a user-friendly interactive web-based interface, allowing users to monitor operations in real-time and make adjustments when needed. 3905 Mask & Wafer Inspection System already proven to be an efficient and cost-effective tool for semiconductor manufacturing. It is reliable and delivers consistent results for enhancing the overall quality and performance of electronics. With the great potential that comes with this unit, the future looks bright in terms of enhancing semiconductor fabrication process.