Used KLA / TENCOR 50-03000 #9384877 for sale

KLA / TENCOR 50-03000 Mask & Wafer Inspection Equipment is an automated surface-inspection tool for applications such as implantable wafer fabrication, optical processor chip manufacturing, power device fabrication, and advanced semiconductor devices. The system helps ensure the integrity and uniformity of these components by providing detailed non-contact analysis of various sizes of finished parts. The unit utilizes high-resolution infrared imaging and scanning technology to accurately detect a wide range of defects such as hillocks, voids, node-dendrite separation, step heights, skeletal features, and lithographic patterns. In addition, the machine can detect multiple defect types including absolute, false, and segmented features. The tool is equipped with an advanced imaging asset featuring a F/1.4 lens and a 16x polarized beam-splitter window, capable of delivering superior resolution that is unmatched by most conventional scanning and imaging systems. It also features a dual dichroic parallelism detection model, which can capture both high contrast and low light levels to greatly enhance the range of defect detectability. The equipment utilizes the latest in laser diffraction and Doppler processing techniques to increase contrast and reduce false positives. Its multi-spectral imaging enables it to accurately capture a wide range of defects in one pass, without the need for multiple out-of-the-box scans. Furthermore, the system is equipped with an advanced defect finding algorithm to ensure detected defects are properly classified and to provide a dedicated report on the defects for diagnostic use. The unit also features a fast and easy to use software suite which allow users to automate their processes and make data-driven decisions. This has simplified the analysis process and enabled users to easily identify and locate defects or anomalies. The software suite is capable of processing data and field-of-view quickly and accurately due to its optimized algorithmic and imaging techniques. KLA 50-03000 Mask & Wafer Inspection Machine is designed to help manufacturers produce higher quality wafer devices quickly and efficiently. Its advanced imaging tool and defect finding algorithms provide superior defect detection capabilities allowing it to detect even the smallest of defects. It also features a user-friendly software suite which provides users with automated processing capabilities and field-of-view data to ensure products are consistently manufactured to the highest quality standards.