Used KLA / TENCOR 7200 #293662762 for sale

KLA / TENCOR 7200 is a mask and wafer inspection equipment designed for advanced optical inspection of masks and wafers. The system is capable of performing a variety of precision measurements for in-process or final-stage wafer inspection, and it has the capability to inspect a variety of materials and technologies, including lithography, resist, and design-related defects. KLA 7200's advanced optics provides a high-quality image suitable for critical review and analysis. TENCOR 7200 utilizes an advanced image-based optical inspection unit with four megapixel color linescan/framescan hybrid cameras. This inspection machine combines visible and near-infrared imaging to detect surface micro defects at a high resolution. Additionally, all images are affected by a range of adjustable parameters, including dynamic range, brightness, gain, and contrast, to ensure the highest image quality and defect detection capabilities. The tool's image analysis technology is engineered to identify and analyze a variety of defects associated with lithography, resist and design-related errors. Its proprietary software suite allows for easy programming and real-time feedback, making the asset very flexible and powerful. Furthermore, its state-of-the-art automated wafer handling model ensures repeatable results, while its automated defect classification feature provides a framework for fast and effective defect analysis. 7200 also provides a range of advanced features that ensure accuracy and efficiency, including automated focus adjustment, lens distortion compensation, pattern recognition, and automated defect identification. Its advanced optics enables the equipment to operate in both uniform and non-uniform illumination environments. Further, it offers direct compatibility with metrology systems such as scanning electron microscopes (SEMs) and scanning white-light-omnidirectional interferometers (SWLI) for further analysis. Additionally, the system can be housed in a variety of small packages, making it economical, easily configurable, and portable. It is compatible with a range of monitors, and its user-friendly interface allows operators to quickly and easily change settings and review data. In summary, KLA / TENCOR 7200 is an advanced mask and wafer inspection unit designed to enable a variety of precision measurements for in-process or final-stage wafer inspection. It offers an array of advanced features, such as dynamic range, brightness, gain, contrast adjustment, and automated focus adjustment, and it is capable of detecting a variety of lithography, resist, and design-related errors. With its advanced optics and automated wafer handling machine, the tool is capable of providing repeatable results with high accuracy. Finally, its flexible design allows the asset to easily adapt to a range of environments and applications.