Used KLA / TENCOR 9110 #293606940 for sale

KLA / TENCOR 9110 Mask and Wafer Inspection Equipment is a high-end automated inspection platform designed for the automated inspection of lithography masks and wafers. KLA 9110 system contains a fully enclosed integrated optical unit, image quality analysis (IQA) algorithms, and a fully automated software suite that allows for fast, accurate results for large-scale jobs. TENCOR 9110 machine features a 5MP CMOS digital imaging platform with adjustable optical, scale and focus sub-systems. The tool is designed with a fully enclosed optical chamber, allowing for a large field-of-view and large dynamic ranges. The optics utilizes a combination of lenses, color filters, and achromatic prisms that enable wide field-of-view, high-resolution imaging and image analysis. KLA algorithm integration enables automatic filter of defects based on CAD patterns, substrate type, asset settings, and several other parameters. The algorithm is complemented by a unique set of measurements including spectrometers, imaging and sizing, die identifier flags, inspection data acquisition and analysis, and defect size measurements. The model also offers an interactive, intuitive user-interface that assists in the qualification of defects, setting up inspection parameters, engineering graphing, pattern recognition and more. This intuitive GUI has a fully integrated help menu, allowing for easy navigation and operation. 9110 Mask and Wafer Inspection Equipment offers extreme accuracy and repeatability. The high level of precision and visualization of the inspection process makes the system well suited for many applications including semiconductor wafer inspection, die-to-die inspections, wafer-level defect representation, and mask integrity and pattern accuracy verifications. In order to ensure the safety and protection of personnel and equipment, the unit includes a suite of accessory components. These accessories include a vacuum machine, cooling tool, mechanical robe, and a self-locking lid that ensures a minimal risk of contamination from outside sources. KLA / TENCOR 9110 asset also comes with skid weight optimization to minimize vibration and improve overall accuracy when processing larger production jobs. Overall, KLA 9110 Mask and Wafer Inspection Model is a reliable, highly accurate, and intuitive inspection platform for the automated inspection of lithography masks and wafers. The numerous features, robust algorithms, and intuitive user experience enable users to process inspection jobs quickly and accurately.