Used KLA / TENCOR Altair 8920i #293768983 for sale

ID: 293768983
Wafer Size: 8"-12"
Vintage: 2022
Inspection system, 8"-12" Si wafers Bright / dark field Pixel size: 0.2 µm 2022 vintage.
KLA / TENCOR Altair 8920i is a sophisticated mask and wafer inspection equipment designed for semiconductor manufacturing facilities to ensure the quality and reliability of integrated circuits. As a critical component of the semiconductor manufacturing process, mask and wafer inspection systems play a vital role in detecting defects and imperfections at various stages of production, thus ensuring the final product meets the stringent requirements of the industry. KLA Altair 8920i is a cutting-edge system that offers advanced inspection capabilities and superior performance to enable high-quality semiconductor fabrication. At the heart of TENCOR Altair 8920i unit is a powerful imaging platform that utilizes advanced optics and high-resolution cameras to capture detailed images of masks and wafers with exceptional clarity and precision. The machine is equipped with multiple inspection modes, including brightfield, darkfield, and DIC (differential interference contrast), allowing users to inspect samples under different lighting conditions to detect defects of varying sizes and types. Altair 8920i also features advanced image processing algorithms that enhance contrast and sharpen details, enabling accurate defect detection and classification. One of the key features of KLA / TENCOR Altair 8920i is its capability to inspect a wide range of samples, including masks, reticles, and wafers with different sizes and materials. The tool supports both reflective and transmissive inspections, making it versatile for various applications in semiconductor manufacturing. Additionally, KLA Altair 8920i offers automated handling and loading mechanisms that streamline the inspection process and improve productivity in high-volume production environments. TENCOR Altair 8920i is designed for high-speed inspection without compromising on accuracy and reliability. The asset can quickly scan large areas of masks and wafers at a high throughput rate, enabling efficient and timely defect detection during the production process. With advanced machine learning algorithms and artificial intelligence capabilities, Altair 8920i can identify and classify defects with high accuracy, reducing the risk of false positives and improving overall yield in semiconductor manufacturing. In addition to defect inspection, KLA / TENCOR Altair 8920i also offers advanced metrology capabilities for measuring critical dimensions and overlay alignment of patterns on masks and wafers. The model can perform high-precision measurements with sub-nanometer resolution, ensuring the quality and consistency of semiconductor devices. By integrating inspection and metrology functions in a single platform, KLA Altair 8920i provides a comprehensive solution for quality control and process optimization in semiconductor manufacturing. Overall, TENCOR Altair 8920i is a state-of-the-art mask and wafer inspection equipment that sets new standards for performance, accuracy, and reliability in semiconductor manufacturing. With its advanced imaging technology, versatile inspection modes, high-speed throughput, and precise metrology capabilities, Altair 8920i is an indispensable tool for ensuring the quality and integrity of semiconductor devices in the fast-paced and demanding semiconductor industry.
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