Used KLA / TENCOR Archer 10 AIM+ #9236397 for sale

KLA / TENCOR Archer 10 AIM+
ID: 9236397
Wafer Size: 12"
Overlay measurement system, 12".
KLA / TENCOR Archer 10 AIM+ is an advanced imaging metrology and defect review (AIMD) solution for mask and wafer inspection. This equipment uses a combination of brightfield light, advanced optics, and fast camera technology to identify defects on masks and wafers. The system uses a high-marked point source (HMPST) to illuminate and capture accurate and repeatable images. KLA Archer 10 AIM+ is equipped with two different imaging modules based on the application: Brightfield and Darkfield. The brightfield module uses brightfield illumination for defect detection and lithography optimization and includes focusing and imaging optics and full-field illumination for automated defect review. The darker field of the unit is designed to increase sensitivity when detecting certain defects such as wet etch adders, bridging, and chipping. The machine can process both large masks and wafers, as large as 6 inches in diameter, up to a maximum temperature of 700℃. TENCOR Archer 10 AIM+ uses advanced hardware architecture to enable fast and efficient data transfer and image processing. Image data collected by the tool is stored in the asset itself, allowing the technician to review and analyze it at any time. The model offers a wide range of features and technologies, including automatic defect review, advanced data analysis, and advanced pattern matching. It also includes object assembly and defect identification tools to accurately locate and classify defects. Further, the equipment is capable of conducting defect analysis to quantify defect types, identify process sensitivities, and generate defect topology reports. In order to ensure accuracy and repeatability, Archer 10 AIM+ features optical autofocus, which is able to analyze a sample to obtain optimal focus and then adjust the sample vibration and position in order to reestablish best focus. The system also has a high brightness option for use in higher temperature environments, as well as a low power option to extend unit life. Finally, KLA / TENCOR Archer 10 AIM+ is equipped with a user-friendly graphical user interface that facilitates easy set-up and programming. The machine also includes real-time error detection and correction capabilities, along with post-processing algorithms for extra accuracy. KLA Archer 10 AIM+ can help wafer and mask manufacturers achieve maximum yields and obtain reliable quality data in a cost-effective manner.
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