Used KLA / TENCOR Archer 10 XT #9250148 for sale

KLA / TENCOR Archer 10 XT is a mask and wafer inspection equipment that provides high throughput and precise metrology for a range of semiconductor process nodes. KLA ARCHER10XT is designed to detect the smallest of features, including line widths of 0.05 µm, making it ideal for top end technology nodes such as 5/5nm. The system offers a wider field of view (FOV) up to 20µm, enabling site-to-site, step-and-repeat measurements. Through the use of advanced algorithms, TENCOR ARCHER 10XT can accurately determine particle presence and their characteristics even in extreme low contrast images. KLA / TENCOR ARCHER10XT is built on an advanced silicon on insulator (SOI) wafer that enables the detection of particles even in very small sizes. Advanced brightfield optics, combined with a greater dynamic range and extended exposure range supports defect detection on dark and reflective surfaces and at all critical layer depths. What makes the unit unique is its hybrid illumination machine which combines enhanced dark field, bright field, and oblique illumination for better contrast and imaging. The advanced software of ARCHER10XT includes proprietary algorithms and simultaneous capture of multiple images for higher defect sensitivity and false call reduction. The tool further offers a wide range of measurement technologies in combination with the easy to use, "Smart-Capture" tool that optimizes inspection settings for high throughput, accuracy and reliability. TENCOR ARCHER10XT also offers a unique package of inspecting capabilities, including edge detection, feature recognition, and barrier layer measurement. The edge detection feature further allows better analysis of mask features, by scanning the full critical mask layer including overlay. The feature recognition technology, supported with advanced algorithms, provides for faster and more accurate measurements of complex shapes and patterns. Finally, the barrier layer measurement feature offers accuracy of up to 0.01µm, ensuring high-fidelity pattern measurements, even for narrow trench lines. When combined, these features provide TENCOR Archer 10 XT with a reliable and efficient solution for mask and wafer inspection. The asset offers advanced metrology for a range of semiconductor process nodes, with accuracy and precision unmatched in the industry.