Used KLA / TENCOR Archer 10 XT #9258184 for sale
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ID: 9258184
Vintage: 2001
Overlay inspection system
FOUP, 12"
Install type: Stand alone
Run daily pm test:
PZT P High voltage
PZT Z gain
PZT Z feedback
Halogen light source
PDA gain, X, Y axis
Wafer surface focus and analysis patent
LINNIK camera uniformity
AMS camera uniformity
Check shutter response time
Fringes ON to OFF mean time
Fringes OFF to ON mean time
GEM/SECS
Line conditioner, 60 Hz
Power requirements: 208/230 V, 3-Phase / 1-Phase, 50/60 Hz.
KLA / TENCOR Archer 10 XT is a mask and wafer inspection equipment designed for use in semiconductor fabrication. It helps to detect and identify defects in photomasks and wafers quickly and accurately. KLA ARCHER10XT is equipped with an automated defect review system that provides a comprehensive analysis of suspicious features, enabling users to investigate and address potential defects in photomasks and wafers quickly and easily. Additionally, the unit has a high sensitivity to detect small defects, capable of resolution levels ranging from 0.7 microns up to 12 microns, depending on the application. TENCOR ARCHER 10XT uses 20X lasers and fast optics to scan the entire surface of a device quickly, without requiring any physical sample movement. The machine is designed to handle a variety of device types, including MEMS/MOEMS, wafers, and photomasks. Its imaging capabilities are also suitable for use with advanced structures, such as FinFETs, Fin Field-Effect Transistors, and HBLEDs, High Brightness Light Emitting Diodes. In addition to the imaging capability, KLA / TENCOR ARCHER 10XT has a range of sophisticated software features to increase speed and accuracy of the inspection process. The tool can be configured to identify and categorize all potential defects based on pre-set criteria, or otherwise specified by the user. Features such as advanced defect clustering, exclusive defect state machine, and synthetic defect generation provide detailed intelligence for advanced data analysis. Furthermore, ARCHER10XT is able to create defect images with configurable lighting, contrast, and color values, and has a powerful post-processing asset with automatic defect size and defect memory comparison software. This enables users to easily visualize and compare any variations in the device before and after their inspection. The model also supports a wide range of interfaces, allowing it to integrate easily with existing production processes. In addition, advanced web and reporting capabilities enable users to access and analyze data remotely. Overall, ARCHER 10XT is an advanced mask and wafer inspection equipment that offers fast and efficient defect detection and analysis with superior accuracy. Its feature-rich software, imaging capabilities, and connectivity options make it a valuable addition for any semiconductor fabrication environment.
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