Used KLA / TENCOR Archer 10 XT+ #9261900 for sale

KLA Archer™ 10 XT+ is a fully automated, high-end equipment for mask and wafer inspection. This system is designed for advanced IC manufacturing applications to detect defects in both photomasks and wafers. KLA / TENCOR Archer 10 XT+ uses high resolution imaging technology that provides high image quality and sharp focus for detecting tiny defects on surfaces. It has an automated metrology unit that can measure and analyze a wide variety of patterns and features. The machine's software-controlled, 5-axis linear motor stage allows rapid and precise manipulation of masks and wafers. The tool is equipped with a laser interferometric scanner that provides up to 10 billion measurement points per wafer. It also has a laser-illuminated, ultra-narrow-field Inspection Head, with an illuminated microscope area that can be used for high-resolution scanning to detect critical defects. KLA Archer 10 XT+ employs powerful image recognition technology to identify defects. Its Imaging Analysis Processing Asset (IAPS) can automatically output data of defect status, and it can detect minute particles, scratches, and minute particles from process contamination. Additionally, the model's remote diagnostic feature provides remote access for evaluation of defect information, fault diagnosis, and status monitoring of equipment operation. Finally, TENCOR Archer 10 XT+ offers a rapid calibration capability that allows for accurate and quantifiable results with minimal downtime. Its high-accuracy, automated calibration equipment can measure the alignment of the optics and the mechanical stage system to ensure the highest accuracy and repeatability. The unit is capable of providing a robust inspection solution for a variety of applications. It can inspect for the most demanding embedded defect inspection needs, including micron-level defects and pattern-based inspection, as well as etch and resist related defects. Its high-end technology and features can ensure quick and accurate detection of defects, along with greater process stability and higher yields.